Molybdenum Targets, Sputtering target is used for magnetron sputtering coating, Sputtering is a new type of Physical Vapor Deposition (PVD) method. Sputtering is widely used in: flat panel displays, glass industry (include architectural glass, automotive glass, optical film glass), solar cells,...
Molybdenum Targets
Sputtering target is used for magnetron sputtering coating, Sputtering is a new type of Physical Vapor Deposition (PVD) method. Sputtering is widely used in: flat panel displays, glass industry (include architectural glass, automotive glass, optical film glass), solar cells, surface engineering, recording media, microelectronics, automotive lights and decorative coating, etc.
Plate Target: Weight≤200kg/pc, Purity ≥99.95%
Tube Target: dia.x Length ≤ Φ165mm x 1000mm, Purity ≥99.95%
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