Molybdenum Target

Molybdenum Targets, Sputtering target is used for magnetron sputtering coating, Sputtering is a new type of Physical Vapor Deposition (PVD) method. Sputtering is widely used in: flat panel displays, glass industry (include architectural glass, automotive glass, optical film glass), solar cells,...

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Molybdenum Targets

Sputtering target is used for magnetron sputtering coating, Sputtering is a new type of Physical Vapor Deposition (PVD) method. Sputtering is widely used in: flat panel displays, glass industry (include architectural glass, automotive glass, optical film glass), solar cells, surface engineering, recording media, microelectronics, automotive lights and decorative coating, etc.

Plate Target: Weight≤200kg/pc, Purity ≥99.95% 
Tube Target: dia.x Length ≤ Φ165mm x 1000mm, Purity ≥99.95% 

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